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4inch 4H-SiC Substrate P-Level N-Type 350.0±25.0μM MPD≤0.5/Cm2 Resistivity 0.015Ω•Cm—0.025Ω•Cm

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Shanghai GaNova Electronic Information Co., Ltd.
City:shanghai
Province/State:shanghai
Country/Region:china
Contact Person:Xiwen Bai (Ciel)
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4inch 4H-SiC Substrate P-Level N-Type 350.0±25.0μM MPD≤0.5/Cm2 Resistivity 0.015Ω•Cm—0.025Ω•Cm

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Brand Name :GaNova
Model Number :JDCD03-002-004
Certification :UKAS/ISO9001:2015
Place of Origin :Suzhou China
Payment Terms :T/T
Delivery Time :3-4 week days
Packaging Details :Vacuum packing in a class 10000 clean room environment,in cassettes of 25pcs or single wafer containers.
Product Name :Sic Epitaxial Wafer
Crystal form :4H
Diameter :100.0mm+0.0/-0.5mm
Surface orientation :Partial crystal direction: 4°<11-20> bias ± 0.5°
Length of main reference edge :32.5 mm ± 2.0 mm
Length of secondary reference edge :18.0 mm ± 2.0 mm
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4inch 4H-SiC substrate D-level N-Type 350.0±25.0μm MPD≤5/cm2 Resistivity 0.015Ω•cm—0.025Ω•cm for power and microwave devices

Overview

High Temperature Devices

Because SiC has a high thermal conductivity, SiC dissipates heat more rapidly than other semiconductor materials. This enables SiC devices to be operated at extremely high power levels and still dissipate the large amounts of excess heat generated from the devices.

High Frequency Power Devices

SiC-based microwave electronics are used for wireless communications and radar.

4inch 4H-SiC N- Type substrate

Product performance P level D level
Crystal form 4H
Polytypic Not allow Area≤5%
Micropipe Densitya ≤0.5/cm2 ≤5/cm2
Six square empty Not allow Area≤5%
Hexagon surface hybrid crystal Not allow
wrappage a Area≤0.05% N/A
Resistivity 0.015Ω•cm—0.025Ω•cm

0.014Ω•cm—0.028Ω•cm

fault ≤0.5% N/A
Diameter 100.0mm+0.0/-0.5mm
Surface orientation Partial crystal direction: 4°<11-20> bias ± 0.5°
Length of main reference edge

32.5 mm ± 2.0 mm

Length of secondary reference edge 18.0 mm ± 2.0 mm
Main reference plane orientation parallel<11-20> ± 5.0˚
Secondary reference plane orientation 90 ° clockwise to the main reference plane ˚ ± 5.0 ˚, Si face up
Orthogonal orientation deviatio

±5.0°

Surface preparation C-Face: Mirror Polishing, Si-Face: Chemical Mechanical Polishing (CMP)
The edge of the wafer angle of chamfer

Surface roughness(5μm×5μm)

Si face Ra<0.2 nm ,Side C, Ra 0.50 nm

thickness

350.0μm± 25.0 μm

LTV(10mm×10mm)a

≤3µm

≤5µm

TTVa

≤6µm

≤10µm

Bowa

≤15µm

≤30µm

Warpa

≤25µm

≤45µm

Broken edge / gap Collapse edges of a length and a width of 0.5mm are not allowed ≤2 and each length and width of 1.0mm
scratcha ≤5,And the total length is≤ 0.5 times the diameter ≤5 ,And the total length is 1.5 times the diameter
Available area

≥95%

N/A

flaw not allow
pollution not allow
Edge removal

3mm

About Us

We specialize in processing a variety of materials into wafers, substrates and customized optical glass parts.components widely used in electronics, optics, opto electronics and many other fields. We also have been working closely with many domestic and oversea universities, research institutions and companies, provide customized products and services for their R&D projects. It's our vision to maintaining a good relationship of cooperation with our all customers by our good reputations.

FAQ

Q: Are you trading company or manufacturer ?
We are factory.
Q: How long is your delivery time?
Generally it is 3-5 days if the goods are in stock.
or it is 7-10 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
Payment <=5000USD, 100% in advance.
Paymen >=5000USD, 80% T/T in advance , balance before shippment.

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